Examples of Dry Etched Features - plasway-Technologies GmbH

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nec volutpat risus.
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  • Plasma (Etch) Process/Tool  Know How
since 25 years
  • Process /Tool Development
  • Experience with Technologies down to 3X nm
  • Dry Etching Experience of almost all Materials
(Si, SiO2,SiON,SiN,Al,C,ZrO,HfO,Nb)
  • High Aspect Ratio Dry Etching
Silicon (80:1) and SiO2 Etch (25:1)
  • Double Patterning
  • Gate Stack / Transistor Etch

Plasway leads the way to Plasma Processing

+49 351 2681262
+49 351 2118294 (fax)
Plasway-Technologies GmbH
Heinrich-Heine-Str. 2b
01728 Bannewitz
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