Process Control and Analytics - plasway-Technologies GmbH
Way´s to efficiency
Maecenas vitae congue augue,
nec volutpat risus.
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Welcome
Consulting
Technology and Pre-Production Support
Production and Process Support
Process Control and Analytics
Part Design and Development
Examples of Dry Etched Features
Training and Plasma School
History, Impressum, Links
History
Links
Impressum
Plasma/Chamber characterization with integrated and or external Sensors
and partly in cooperation with Partners:
Absolute concentration measurement of
Molecules
(Reactants, SiH4
,
SiF4) with
IR
Absorption Analyses
Q
uadropol
M
ass Spectrometry
O
ptical
E
mission
S
pectrometry
Process Analytics and More in cooperation with Partners:
FIB
SEM
EDX
XPS
SIMS
TOF SIMS
TEM
In addition interpretation of analytics and support in route cause analyses.
Definition of next Steps
Especially in the area of Dry Etching direct proposal for recipe optimization.
Welcome
|
Consulting
|
Process Control and Analytics
|
Part Design and Development
|
Examples of Dry Etched Features
|
Training and Plasma School
|
History, Impressum, Links
|
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Plasway leads the way to P
lasma Processing
+49 351 2681262
+49 351 2118294 (fax)
Plasway-Technologies GmbH
Heinrich-Heine-Str. 2b
01728 Bannewitz
Germany
info@plasway.de
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